Nanofabrication service

Wet etching

Wet etching provides a simple and cheap method of pattern transfer after photolithography. Its advantage is excellent selectivity (usually 100%), but its main disadvantage is that it gives little control over the etch profile.

Our wet etch room provides a safe environment for wet etching of a wide variety of materials.

Standard wet processes:
  • 7:1 buffered hydrofluoric acid
  • 20:1 buffered hydrofluoric acid
  • Potassium hydroxide at 70 C
  • RCA clean
  • Fuming nitric acid
  • HF vapour etcher